SJ-26 Evaporator

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Description¶

One of several Physical Vapor Deposition (PVD) tools, similar in operation to Enerjet Evaporator. Used for depositing insulators and optical materials (thickness.5um+) Designed for depositing when liftoff is intended.

Specifications¶

• Used for metal and dielectric PVD.
• Fixturing Lift-off dome standard. One custom for high yield dielectric PVD.
• Substrate size:Fragments up to 4 inch.
• Maximum capacity: 6,4" wafers. plus 8,3" wafers.
  

Materials¶

• with max thickness
• Al2O3 3000Ǻ
• Ge 4000Ǻ
• Au 5000Ǻ
• MgF2 1-4 micron/ZnSe 1-4 micron both rotation dependent- if stacked properly is insulating reflecting diffraction grating.
• Ti 1 micron
• TiO2
• Pd 2000Ǻ
• Glasses: SiO2 2000Ǻ, SiO 2000Ǻ.
• Fe- for growing Carbon nanotubes
  

Applications¶

• Magnetic Recording Media
  

Tool Documents¶

• Overview http://ssel-sched.eecs.umich.edu/ToolDocs/doc00146.pdf
• SOP http://ssel-sched.eecs.umich.edu/ToolDocs/doc00196.pdf
• Characterization Data http://ssel-sched.eecs.umich.edu/ToolDocs/doc00197.pdf