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Description
A tool that converts specially formatted data files into mask patterns, then patterns
masks used for
lithography. See
Mask Making process. Located in room
1440A of the Clean Room of the
Lurie Nanofabrication Facility.
Requirements
- Blank Mask (can be purchased from the LNF Store)
- DAT fractured file
Usage
- LNF users (internal or external) are charged hourly at a rate.
- You must be an authorized user of the tool, but may not need full clean room access
- Typically achieves flash count rate of ~3500/hour but this can vary dramatically depending on the complexity of your mask, ranging from 3000 to 4000 flashes/hour
Tool Documents