Lurie Nanofabrication Facility

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Facility Description¶

"The LNF is available, on a fee basis, for use by research groups from government, industry and universities. Equipment and processes are available for research on silicon integrated circuits, MEMS, III-V compound devices, organic devices and nanoimprint technology." -LNF website

The facility is described at its website, and the equipment, materials, chemicals, processes and facilities used to develop devices or applications are described in this Wiki.

Clean Room¶

Description¶

The Clean room of the LNF.

• Processes
• Equipment
• Chemical Benches
• Staff Pages
• LNF Store
  

General Rules¶

• Rules of conduct
• Do not bring paper/ cardboard products into lab. If you need a notebook, buy one from the LNF Store.
• Wear Gown. See Gowning page for proper procedure.
  

1440A¶

• Si Bay
• Thermco A furnace: See A1, Sintering, A2, Boron-dope, A4, Boron ANL/Oxide
• Mask Maker
• Solitec Spinner
• CEE Spinner
• Solvent Bench 1440A
• Hot Plates
• Mask Clean Bench 1440A
• Acid Bench 1440A
• Base Bench 1440A
• Pre-Furnace Clean Bench 1440A
• Single Stack Spin Rinse Dryer
  

1440B¶

• Special Projects Bay
  

• Tempress Stack 6 (D-stack) furnace
• Acid Bench 1440B
• Base Bench 1440B
• Hot plates
• STS Deep Silicon Etcher
  

1440C¶

• GaAs Bay
• Acid Bench 1440C
• Solvent Bench 1440C
• Base Bench 1440C
• Sonicator 1440C
• Headway Spinners
• Hot Plates
• Electroplating Fume Hood 1440C
• Gold Plating Station
  

1440D¶

• Thin Film Bay
• EnerJet Evaporator
• Cooke Evaporator
• SJ-20 Evaporator
• SJ-26 Evaporator
• Enerjet Sputter Coater
  

1440E¶

• Plasma Bay
• GSI PECVD
• Oxford ALD
  

1440S¶

• Computers
• Bottle Rinse Station
• Zygo NewView 5000
• Miller FPP-5000 4-Point Probe
• Dektak 6 M Surface Profilometer
  

1448¶

• AutoEL Ellipsometer
• Flexus 2320-S
• NanoMan AFM
• NanoSpec 6100
• Height Gauge
  

1450¶

• Lithography
• ACS 200 cluster tool
• EVG620 Bond Aligner
• EVG501s bonder
• GCA AS200 AutoStep
• MA/BA-6 Mask/Bond Aligner
• MA6 Mask Aligner
• Raith-150 E-beam
  

1348¶

• Gowning Room
  

1480A¶

• E-beam Bay
• SEM In-Line
• Denton Explorer-14
  

1480B¶

• STS Pegasus 4
• STS Pegasus 6
• Hot Plate
• STS Glass Etcher
• PDS 2035
  

1480C¶

• Tempress S1
  1. S1 T1 - Annealing 100mm and 150mm
  2. S1 T2 - LTO 100mm only (No Metals)
  3. S1 T3 - N-Type in Situ Doped Poly-Si 150mm only
  4. S1 T4 - LTO 150mm only (No Metals)
     

• Tempress S2
  1. S2 T2 - Nitride-HTO 100mm only
  2. S2 T3 - Nitride-HTO-Oxynitride 100mm only
  3. S2 T4 - Low Stress Nitride 100mm only
     

• Tempress S3
  1. S3 T1 - Dry Oxidation 100mm and 150mm
  2. S3 T2 - Wet Oxidation 100mm and 150mm
  3. S3 T3 - Flat Poly-Si 100mm only
  4. S3 T4 - N-Type in Situ Doped Poly-Si 100mm only
     

• Tempress S4
  1. S4 T2 - PSG 150mm only
  2. S4 T3 - P-Type in Situ Doped Poly-Si 150mm only
  3. S4 T4 - TEOS 150mm only
     

• Tempress S5
  1. S5 T1 - Phosphorous Diffusion 100mm only
  2. S5 T2 - Phosphorous Anneal-Oxidation 100mm only
  3. S5 T3 - Boron Diffusion 100mm only
  4. S5 T4 - Boron Anneal-Oxidation 100mm only
     

• PFC-01 wet bench
  

For Wet Chemistry Lab, See Wet Chemistry Page