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GCA AS200 AutoStep

GCA AS200 AutoStep


The GCA AS200 AutoStep is a 5x reduction, i-line, step-and-repeat exposure tool used for patterning photoresist coated wafers. It can handle samples up to 150mm in diameter and can pattern feature sizes down to 0.5 microns. The light intensity for the GCA stepper is 300 mW/cm2 at 365 nm. See the Lithography Handbook page for more information on lithography/exposure times.

Reticle Alignment Marks

alignment marks

Tool Documents

  Name Size
- GCA Alignment 2.81 KB
- GCA.png 29.85 KB
© 2011 Lurie Nanofabrication Facility, University of Michigan