GCA AS200 AutoStep

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GCA AS200 AutoStep

Description¶

The GCA AS200 AutoStep is a 5x reduction, i-line, step-and-repeat exposure tool used for patterning photoresist coated wafers. It can handle samples up to 150mm in diameter and can pattern feature sizes down to 0.5 microns. The light intensity for the GCA stepper is 300 mW/cm2 at 365 nm. See processes page for more information on lithography/exposure times.

Reticle Alignment Marks¶

alignment marks

Tool Documents¶

• Reticle Design Manual http://ssel-sched.eecs.umich.edu/ToolDocs/doc00004.pdf
• SOP http://ssel-sched.eecs.umich.edu/ToolDocs/doc00003.pdf
• Overview http://ssel-sched.eecs.umich.edu/ToolDocs/doc00069.pdf