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Raith-150 E-beam

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Raith-150 E-beam

Description

A nanolithography system used for creating sub micron patterns. Tool specifications: Min. feature size: 50nm Wafer/sample size: 1 cm – 4” round or 5” x 5” plates Field emission cathode Accelerating voltage: 500V – 30kV Field size: 10- 400um

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© 2011 Lurie Nanofabrication Facility, University of Michigan
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