Chemicals

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Table of Contents [Hide/Show] Description Clean Room    Acids    Bases    Solvents    Developers    Photoresists        AZ Series        950k Series PMMA        Primers/ Adhesion Promoters        S1800 Series        SU-8 Series        SPR 220        Cyclotene Series        Lift off resist (LOR) (Not Supplied)    Other Polymers Not Supplied/Personal Supplied only Supplied in Tanks Only

Description¶

The following is a list of all of the chemicals used in the clean room and wet chem (with a note whether the chemical is not supplied). Be sure to read the LNF Lab Training Manual. For more information on etchants, see Processes page.

Clean Room¶

Acids¶

• Acetic Acid
• Aluminum Etch A
• Ammonium Fluoride (cmos)
• Buffered Hydrofluoric Acid or "BHF"
• Chrome etch, (CR-14)
• Citric Acid, (1 Molar)
• Gold Etchant, (TFA)
• Hydrobromic Acid (500 ml)
• Hydrochloric Acid (cmos)
• Hydrofluoric Acid (cmos)
• Nitric Acid (cmos)
• Phosphoric Acid (cmos)
• Sulfuric Acid (cmos)
  

Bases¶

• Ammonium Hydroxide (cmos)
• Ammonium Persulfate, (25 g)
• BDT 510 Make-up
• Catechol
• CR-2
• Ethylene Diamine
• Hydrogen Peroxide (cmos)
• Paraffin Wax Flakes (1kg)
• Potassium Hydroxide
• Pyrazine
• Sylgard 184 Silicone elastomer kit
• TMAH 10% in Water (1 Liter)
• Trichloro(3,3,3-trifluoropropyl)silane(97%)
• KOH pellets
  

Solvents¶

• Anisole (not supplied)]
• 2-Propanol (cmos) - IPA
• Acetone (cmos)
• Chlorobenzene (cmos)
• Ethanol, (200 proof)
• Methanol (cmos)
• Methyl Iso-Butyl Ketone (cmos)
• PRS-1000 (cmos)
• PRS-2000 (cmos) (supplied in tanks)
• Trichloroethylene (cmos)
• Xylenes (cmos)
• Nano EBR PG
• Remover PG
• 2-Ethoxyethanol (not supplied)
  

Developers¶

• note that most developers are bases
  

• 1112A Remover
• Developer, AZ 300
• Developer, AZ 400K
• Developer, CD-30
• Developer, MF 319
• Developer, MF 351
• Developer, MF 726
• RD2 developer (not supplied)
• RD6 developer (not supplied)
• SU-8 Developer (solvent)
  

Photoresists¶

• NR8 – 1500 photoresist (not supplied)
• NR9-1500PY (not supplied)
  

AZ Series¶

• Photoresist, (AZ5214-E) (IR)
• Photoresist, (AZ9260)
  

950k Series PMMA¶

• 950K PMMA A 2%(500ml)
• 950K PMMA A 4%(500ml)
• 950K PMMA A 6%(500ml)
• 950K PMMA A 9%(500ml)
  

Primers/Adhesion Promoters¶

• HMDS (100%)
• Omni Coat
  

S1800 Series¶

• Photoresist, (S1813)
• Photoresist, (SC 1827)
  

SU-8 Series¶

• Photoresist, (SU-8 2010)
• Photoresist, (SU-8 5)
  

SPR 220¶

• Photoresist, (SPR 220 - 3)
• Photoresist, (SPR 220 - 3) now pack 1gal
• Photoresist, (SPR 220 - 7)
  

Cyclotene Series¶

• CYCLOTENE 3022 - 35 Advanced Electronics Resin (not supplied)
  

Lift off resist (LOR) (Not Supplied)¶

• LOR 3A
• LOR 5A
• LOR 7A
• LOR 5B
• LOR 10B
• LOR 20B
  

Other Polymers¶

• PDMS
  

Not Supplied/Personal Supplied only¶

• Anisole (not supplied)
• Nickel Etchant TFP
• Palladium Etchant TFP
• Pad Etch I (chemical solution)
• Liquid Bromine (Br2)
• EDTA
• Tetramethylammonium Hydroxide
• NR8 – 1500 photoresist
• NR9-1500PY
• RD2 developer
• RD6 developer
• CYCLOTENE 3022 - 35 Advanced Electronics Resin
• 2-Ethoxyethanol (not supplied)
• Sodium Sulphate (anhydrous)
  

Supplied in Tanks Only¶

• PRS-2000 (cmos)