Aluminum Oxide (Alumina)

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Description of Material¶

Aluminum Oxide

Properties¶

Al2O3 Alumina films possess excellent chemical stability, high hardness.

Processing Tools¶

Evaporate with SJ26 300nm by Physical Vapor Deposition (PVD). By thermal oxidation and, anodic oxidation, thermal spray, and plasma oxidation.

Applications¶

• Saphire is used as a substrate.
• native oxide on Al is too thin ( 2 nm) to be used as either a protective layer or component of a device
• Is natural candidate for protective coatings.
• also employed as a gate dielectric and or a tunneling barrier and in semiconductor devices
  

Citations¶

Fu-Hsing Lu “Plasma oxidation of Al thin films on Si substrates”Thin Solid Films Volume 516, Issue 8, 29 February 2008, Pages 1871-1876

Processes¶

• Chromerge Cleaning Solution
• Creating a Photoresist Mask on Lithium Niobate Sample