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Description of Material
Al2O3 Alumina films possess excellent chemical stability, high hardness.
Evaporate with SJ26
300nm by Physical Vapor Deposition (PVD)
. By thermal oxidation and, anodic oxidation, thermal spray, and plasma oxidation.
- Saphire is used as a substrate.
- native oxide on Al is too thin ( 2 nm) to be used as either a protective layer or component of a device
- Is natural candidate for protective coatings.
- also employed as a gate dielectric and or a tunneling barrier and in semiconductor devices
Fu-Hsing Lu “Plasma oxidation of Al thin films on Si substrates”Thin Solid Films
Volume 516, Issue 8, 29 February 2008, Pages 1871-1876