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Acetone (cmos)
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Modified on 02/21/2012 11:55 AM
by
Hower, Robert
Categorized as
Chemicals
,
Chemicals Solvent
Chemicals
Edge Bead Removal
HF-Nitric
MEMS Device Release
Chemicals
Edge Bead Removal
HF-Nitric
MEMS Device Release
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Acetone (cmos) (Public)
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Acetone (cmos) (Public)
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Description
¶
Acetone is a solvent. Used to clean off polymeric material from the surface of silicon.
Processes
¶
Edge Bead Removal
Used in the process
HF-Nitric
. This process is done in the Wet Chemistry Lab.
MEMS Device Release
Locations
¶
Solvent 14
Solvent bench Wet Chemistry
MSDS
¶
attached to this page
Name
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Acetone 9005.pdf
103.97 KB
© 2011 Lurie Nanofabrication Facility, University of Michigan