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Description
This tool is one of several
Lithography tools. A robotic arm transports wafers from task to task.
Tasks
- Coating/Spinning Photoresist
- Stripping Photoresist
- Baking Photoresist
- Developing Photoresist
Processes
- Photoresist Coating for AZ9260 > 10 microns film thickness or SPR 220 3.0 for films of 3 or 5 micron thickness.
Process example
This process uses a photoresist, a wafer, a mask, the
Mask Maker, the ACS Cluster tool, a
Controlled Exposure Tool, and the
Mask Clean Bench 1440A.
- Do Mask Making process using Mask Maker and chemical bay.
- Do Mask Clean process at Mask Clean Bench 1440A.
- Do Photoresist Coating process (recipe depends on photoresist type).
- Do Contact Exposure or Auto Exposure process (exposure time depends on photoresist).
- Do Develop on ACS 200 cluster (recipe depends on photoresist type).
Tool Documents